A technical drawing of a Nexus Semi-Automated System.

The Nexus System delivers exceptional flexibility and efficiency by combining both linear and rotational robotic motion.

A technical drawing of a Nexus Semi-Automated System variant.

The Nexus System delivers exceptional flexibility and efficiency by combining both linear and rotational robotic motion to move wafer cassettes to any programmed destination. Its advanced robotics allow smooth side-to-side travel and front-to-back positioning through a compact rotational mechanism, enabling a significantly smaller overall system footprint compared to traditional linear designs. This innovative approach maximizes cleanroom space while maintaining high throughput and reliable wafer handling performance.

The Nexus System delivers exceptional flexibility by combining linear and rotational robotics for a smaller footprint and high throughput. This innovative approach maximizes cleanroom space while maintaining reliable wafer handling performance, offering unmatched reach, speed, and versatility.

Designed to deliver maximum capability while occupying minimal cleanroom space.

Space-Optimized Footprint

Engineered for fast, efficient, production-grade wafer handling.

Accelerated Throughput

Advanced control technology ensures exceptional consistency and repeatability.

Precision Process Intelligence

Innovative linear + rotational motion provides unmatched reach, speed, and flexibility.

Dual-Mode Robotics

Built for continuous uptime with industry-proven components and rugged engineering.

Uncompromising Reliability

A highly adaptable platform that fits effortlessly into virtually any process flow.

Design Versatility

Fully customizable configurations to match your exact application needs.

Tailored System Options

A modern, user-friendly interface that accelerates training and boosts operator confidence.

Intuitive GUI Experience

A dedicated rear-access maintenance area incorporates dual containment for reservoirs, pumps, filters, and associated plumbing, ensuring safe serviceability and environmental protection.

Rear Access

End Effector

High-frequency acoustic energy for superior particle removal and advanced cleaning efficiency.

Megasonic Process Tanks

Uniform agitation technology for consistent cleaning, rinsing, or etching performance.

Ultrasonic Process Tanks

Precision engineered for stable thermal control, clean chemical flow, and repeatable process performance.

High-Performance Recirculation Tanks

Closed-loop precision delivery for maintaining ideal chemistries during operation.

Automated Chemical Dosing / Spiking

Flexible supply options for new or existing facility infrastructure.

Bulk or On-Board Chemical Delivery

On-board chemical evacuation directly to facility collection or waste systems.

Optional Integrated Pump-Out System

Ergonomic staging areas that streamline cassette handling and operator workflow.

Load & Unload Platforms

Enables true dry-in / dry-out operation, reducing handling steps and maximizing throughput.

Integrated NexChem Delta Marangoni Dryer

Automatic detection and suppression system for enhanced safety and code compliance.

Fire Suppression System

The Nexus System combines linear and rotational robotics for a smaller footprint and high throughput.

Semi-Automated System

Nexus Series

High performance. Maximum safety. Built for every application—from cleanrooms to research labs.

Modular wet processing components ready for assembly.

NexChem fume hoods and wet benches deliver precision airflow and chemical-resistant construction for semiconductor fabs, laboratories, universities, and R&D facilities. Available in FM-4910 polymer for acids/bases or stainless-steel solvent-rated designs for IPA, acetone, and flammables.

At the core of every Gamma system is a fully enclosed fume hood architecture designed for containment, airflow stability, and long-term compliance.

Fully enclosed fume hood shell (default Gamma architecture)

Enclosed Fume Hood

Optimized airflow geometry with dedicated exhaust connection

Optimized Airflow

FM-4910-rated polymer construction (CRP-1 available)

High-Grade Polymer Construction

Stainless-steel solvent-rated configurations available

Solvent-Rated Steel Option

Large clear-view sash with LED work lighting

LED-Lit Viewport

Rear service access for utilities, filtration, and maintenance

Easy Service Access

Ventilated Storage

Cleanroom-compatible, chemical-resistant interior surfaces

Cleanroom Ready

Compliance-ready design supporting UL, SEMI S2, CE, and third-party electrical inspections

Compliance Ready

This wet bench configuration is a simplified, open or semi-open variant of the same Gamma platform, optimized for hands-on processing where full enclosure is not required.

- Manual wet processing 
- Academic laboratories 
- Process development and R&D 
- Low-to-medium volume applications

Ideal For

- Open access work area 
- Shared Gamma platform architecture 
- Utility-focused configuration with reduced enclosure 
- Upgrade path to full containment if requirements change

Key Features

- DI water manifolds 
- Rinse guns 
- Integrated utility sink with gooseneck faucet 
- GFCI-protected electrical outlets 
- Ergonomic operator control panels

Integrated Utilities 
& Work Area Options

The NexChem high performance recirculating process baths are designed to provide safe, reliable, clean operation in conjunction with a variety of pneumatic bellows recirculating pumps and filters.  Recirculation rates will depend upon the exact combination of bath, pump size, and filter porosity.

The NexChem Quick Dump Rinse (QDR) Bath is a high-efficiency rinsing module essential for semiconductor wet processing, designed to rapidly and thoroughly remove residual chemicals, particles, and contaminants from silicon wafers after etching, cleaning, or other chemical steps.

Enhance your Gamma system with a range of integrated modules and accessories designed to improve performance, safety, and ergonomics.

Advanced megasonic technology for sub-micron particle removal and enhanced cleaning uniformity.

Megasonic Tanks

High-frequency ultrasonic agitation to improve cleaning efficiency and reduce cycle times.

Ultrasonic Tanks

Ergonomic solutions to support throughput and reduce operator strain.

Automated Parts Loading or Lift Assist

Dedicated maintenance area for pumps, plumbing, reservoirs, and filtration assemblies.

Rear Service Access

Supports reusable or disposable containers for safe chemical waste capture.

Carboy Collection Interface

CO₂ suppression option for enhanced operational safety.

Exhausted compartment for chemicals, tools, or support equipment.

Ventilated Lower Storage

Ergonomically placed controls and safety interfaces for intuitive operation.

Operator Control Panels

GFCI-rated electrical connections for safe in-hood power distribution.

Protected Power Outlets

Built-in sink with gooseneck faucet providing flexible water access for rinsing, cleaning, and general workflow support.

Integrated Utility Sink & Gooseneck Faucet

The Gamma Series offers high-performance fume hoods and manual stations built for safety and versatility in any application.

Fume Hoods and Manual Wet Benches

One standardized platform across multiple applications

Safety-first design simplifies EHS and compliance reviews

Modular architecture supports future upgrades

Faster quoting, engineering, and delivery

Premium performance without custom-tool complexity

Why Gamma

Dilute HF (dHF) + Ozone (O3) or CO2-infused final clean

Hot Phosphoric Acid etch

Selective silicon nitride (Si3N4) removal

Piranha (SPM) clean

Aqua Regia (HCl + HNO3)

Noble metal & certain metal contamination removal

SC-1 (APM) variants

SC-2 (HPM) variants

Ozone-based chemistries (DI-O3)

Post-CMP cleans

Tungsten recess etch (selective W etch-back)

Polysilicon etch-back

Thermal oxide / field oxide etch

RCA + advanced variants

Gamma Series

A high-performance wafer drying solution engineered for defect-free, watermark-free drying following wet chemical processing.

A technical drawing of a Delta Gradient Drying System.

The NexChem Systems Delta Series IPA Vapor Marangoni Gradient Dryer is a high-performance wafer drying solution engineered for defect-free, watermark-free drying following wet chemical processing. Utilizing a controlled IPA vapor Marangoni effect, the Delta Dryer delivers consistent surface tension gradients that drive uniform liquid removal without mechanical stress or particle generation. Designed for seamless integration with NexChem wet benches or as a standalone module, the Delta Series supports high-purity processes, repeatable results, and scalable automation for advanced manufacturing environments.

The Delta Series is a high-performance wafer drying solution that ensures defect-free, watermark-free results using a controlled IPA vapor Marangoni effect. This system supports high-purity processes and repeatable results, designed for seamless integration or as a standalone module for advanced manufacturing.

The Delta Series utilizes a precisely controlled IPA vapor zone introduced at the wafer-liquid interface during withdrawal from the final rinse. As IPA concentration increases at the meniscus, surface tension is locally reduced, creating a surface tension gradient that uniformly pulls DI water downward and away from the wafer surface.

Ensures a perfectly dry, spot-free surface every time by removing liquid at the meniscus.

Eliminate Watermarks

Prevents streaks by maintaining a uniform surface tension gradient during the entire withdrawal process.

No Streaking

Reduces particle redistribution and contamination for high-purity processing.

Particle Control

Avoids centrifugal stress and vibration common in spin drying, protecting delicate features.

Stress-Free Drying

Protects fragile and high-aspect-ratio structures that can be damaged by mechanical drying.

Structural Protection

Drying performance is governed by controlled vapor, withdrawal velocity, and exhaust stability managed via recipe-driven automation.

Precision Automation

Controlled Marangoni Gradient Drying

IPA Vapor Marangoni Drying Process

Gradient-Controlled Vapor Introduction for uniform drying

Dry-In / Dry-Out Capability when integrated into automated wet benches

FM-4910 Compliant Materials

High-Purity PFA / PTFE Wetted Components

Minimal IPA Consumption through optimized vapor control

Low Defect, Low Particle Drying Performance

Designed for Semiconductor, Advanced Packaging, MEMS, and Precision Manufacturing

Inline integration with NexChem wet benches

Standalone dryer module

PLC-based automation with touchscreen HMI

Recipe-based drying profiles

Adjustable IPA vapor ramp rates

Alarm monitoring and interlocks

Facility bulk IPA supply

Manual fill through tear drop funnel

Primary Structure: FM-4910 CRP-1

Process Vessel: PVDF

Wetted Surfaces: High-purity PFA / PTFE

Exhaust Interface: Facility exhaust compatible with IPA vapor processes

Safety: Integrated interlocks, vapor monitoring, and EMO support

Semiconductor wafer processing

Advanced packaging and compound semiconductors

MEMS and sensor fabrication

Optics and precision substrates

Post-clean drying for critical surface applications

The Delta Series is an IPA Vapor Marangoni Gradient Dryer for defect-free, watermark-free wafer drying.

IPA Vapor Marangoni Gradient Dryer

Delta Series

- Scalable from R&D to full production
- Automated transfer from drums, totes, or carboys
- Cleanroom-safe FM-4910 or stainless-steel construction
- Integrated containment & leak monitoring
- Simple PLC/HMI interface for real-time status

Why Sigma?

A manual wet bench for laboratory research and development.

Flexible delivery platforms for drums, totes, and carboys.

Two manual wet benches for laboratory research and development side by side with doors open.

The Sigma Series is NexChem's modular chemical management platform designed to safely store, deliver, meter, distribute, and collect process chemistries across wet processing environments.
        
Built for semiconductor, advanced packaging, MEMS, and precision manufacturing facilities, Sigma systems provide scalable chemical infrastructure — from compact single-drum configurations to multi-drum and tote-based supply platforms.

The Sigma Series provides safe, automated, and reliable chemical delivery for any production environment. Whether you need a single drum, dual-drum setup, large chemical tote, or carboy system, Sigma offers a scalable solution designed to match your process and facility requirements.

The Sigma-100 is engineered for labs, universities, and single-tool setups that require clean and dependable chemical delivery. Supporting one 55-gallon drum or carboy, it delivers straightforward automation and essential safety protections in a compact footprint.

Single 55-gallon drum

Carboys / small vessels

The Sigma-200 expands capacity with support for dual 55-gallon drums or a single 260–330 gallon chemical tote. Ideal for multi-module wet benches and growing fabs, it can manage one or two chemistries with simple, clean automation.

Single or dual drums

One chemical tote (260–330 gallons)

Optional carboy inputs

The Sigma-300 is built for high-volume production, centralized chemical rooms, and multi-tool distribution networks. It handles totes, dual-tote switchovers, drums, and carboys, supporting multiple chemistries with the highest capacity in the Sigma family.

Single or dual totes

Drums and carboys

Multi-chemistry configurations

The Sigma Series provides safe and automated chemical delivery platforms for drums, totes, and carboys.

Point-of-Use Chemical Routing with Manual or Automated Valves. Sigma Valve Boxes provide clean, organized, and reliable chemical distribution at the point of use. Designed for acids, bases, and solvents, each valve box can be configured with a mix of manual isolation valves and air-operated valves (AOVs) and integrates seamlessly with tool PLCs and facility interlocks. Whether feeding a single wet bench or multiple stations across a bay, Sigma Valve Boxes extend the Sigma chemical management platform directly to the production floor.

Available in FM-4910 plastics or stainless steel for solvent service

Supports multiple chemistries with dedicated plumbing and labeling

Clean, compact routing panel with organized manifolds

Configurable with manual valves, AOVs, or a hybrid layout

Leak detection

Top or bottom facility connections for flexible installation

Sigma Lift Stations provide controlled transfer of chemical waste, rinse water, solvents, or process effluent from local collection points to facility drain systems or remote waste tanks. Built for acids, bases, and solvents, each lift station includes automated pump operation, level monitoring, and integrated safety features. Designed to complement the Sigma Chemical Management Systems, these stations create a complete, end-to-end routing and return solution.

Compatible with acids, bases, and solvents

Available in FM-4910 plastics, polypropylene, or stainless steel for solvents

Automated pump control with reliable start/stop level sensing

Integrated secondary containment with leak detection

Clean, compact tank footprints for tight tool bays

Dedicated drain or return connection for safe discharge

Optional dual-pump redundancy for continuous uptime

Sigma Metering Systems deliver accurate, repeatable chemical dosing for spiking, blending, and controlled delivery. Designed for acids, bases, and solvents, they integrate directly with Sigma CMS platforms for clean, recipe-driven operation.

The NexChem Ecosystem

Semi-Automated System

Fume Hoods and Manual Wet Benches

IPA Vapor Marangoni Gradient Dryer

Chemical Management Systems

Quartz Tube Wash Systems

OEM & Specialty Process Systems

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